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Presentations from The 4th Israeli SUSS MicroTec Conference 2017
Please contact us for your Username and Password:
[email protected]
10:10 Recent developments in coating technology:
Dr. Andrzej DZWILEWSKI
10:30
Conformal coating:
Dr. Andrzej DZWILEWSKI
10:50
Mask Aligners : Tips and innovative technics to improve resolution: Philippe STIEVENARD
11:45
1x Projection Scanners and Mask aligners: complementary tools to other lithography technics:
Philippe STIEVENARD
12:00
Infinite Variety of Permanent Wafer Bonding Application and the new trend of the high force bonding of AlGe for WLP: Margarete ZOBERBIER
12:45 SUSS UV-SCIL and micro resist technology materials: a powerful match for versatile high-volume industrial imprint:
Dr. Eleonora STORACE
14:00
Novel Resins for Classic and e-Beam Lithography: Allresist GmbH
14:30
Ablation Stepper : Reduce your process steps and extend your material range: Philippe STIEVENARD
15:15
Temporary Bonding and debonding solution for 2.5D and 3D Application and FO WLP: Margarete ZOBERBIER
15:45
SUSS SMILE technology: an advanced solution enabling wafer level optic processing:
Dr. Eleonora STORACE
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