Dry Etching Presentations and Publications

NASA JPL Enhances Device Fabrication Capability with New Plasma-Therm System

Deep Silicon Etcher

 

Plasma-Therm’s VERSALINE® Deep Silicon Etch™ system was recently installed at NASA’s Jet Propulsion Laboratory (JPL) to expand its silicon deep-etching resources. The new etching system targets silicon-based applications that include MEMS, sensors, and resonators. JPL’s Microdevices Laboratory (MDL) serves users with many different requirements, and the system’s mask selectivity, uniformity, vertical profiles, sidewall smoothness, and silicon-on-insulator capabilities will be used to meet their device fabrication needs. Read More